Invention Grant
- Patent Title: Semiconductor device having wave gate
- Patent Title (中): 具有波形栅极的半导体器件
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Application No.: US14444155Application Date: 2014-07-28
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Publication No.: US09269810B2Publication Date: 2016-02-23
- Inventor: Seung-Uk Han , Won-Kyung Park , Jun-Ho Park , Jun-Hee Lim , Ki-Jae Hur
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2013-0157444 20131217
- Main IPC: G11C5/02
- IPC: G11C5/02 ; H01L29/78 ; H01L27/088 ; G11C7/06 ; G11C16/26 ; G11C11/4091

Abstract:
A semiconductor device includes an active region defined on a substrate, a gate electrode disposed on the active region and covering two adjacent corners of the active region, a drain area formed in the active region adjacent to a first side of the gate electrode, and a source area formed in the active region adjacent to a second side of the gate electrode. The first and second sides of the gate electrode are spaced apart from each other, and the first side has a bent shape.
Public/Granted literature
- US20150171215A1 SEMICONDUCTOR DEVICE HAVING WAVE GATE Public/Granted day:2015-06-18
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