A siloxane composition and a method of producing the same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane is cross-linked during condensation polymerization to increase molecular weight thereof.The composition can be used in high-resolution negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process.