Invention Grant
- Patent Title: Methods of forming wiring structures
- Patent Title (中): 形成布线结构的方法
-
Application No.: US14527842Application Date: 2014-10-30
-
Publication No.: US09281277B2Publication Date: 2016-03-08
- Inventor: Jong-Min Baek , Sang-Ho Rha , Woo-Kyung You , Sang-Hoon Ahn , Nae-In Lee , Ki-Chul Kim , Jeon-Il Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel & Sibley, P.A.
- Priority: KR10-2013-0161485 20131223
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L23/532 ; H01L21/768 ; H01L23/522

Abstract:
A wiring structure includes a first insulation layer, a plurality of wiring patterns, a protection layer pattern and a second insulation layer. The first insulation layer may be formed on a substrate. A plurality of wiring patterns may be formed on the first insulation layer, and each of the wiring patterns may include a metal layer pattern and a barrier layer pattern covering a sidewall and a bottom surface of the metal layer pattern. The protection layer pattern may cover a top surface of each of the wiring patterns and including a material having a high reactivity with respect to oxygen. The protection layer pattern may cover a top surface of each of the wiring patterns and including a material having a high reactivity with respect to oxygen.
Public/Granted literature
- US20150179582A1 WIRING STRUCTURES AND METHODS OF FORMING THE SAME Public/Granted day:2015-06-25
Information query
IPC分类: