Invention Grant
US09286973B2 Device and method for forming resistive random access memory cell
有权
用于形成电阻随机存取存储单元的装置和方法
- Patent Title: Device and method for forming resistive random access memory cell
- Patent Title (中): 用于形成电阻随机存取存储单元的装置和方法
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Application No.: US14034717Application Date: 2013-09-24
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Publication No.: US09286973B2Publication Date: 2016-03-15
- Inventor: Chih-Yang Chang , Wen-Ting Chu , Yu-Wei Ting , Chun-Yang Tsai , Kuo-Ching Huang
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: Jones Day
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C13/00

Abstract:
A device and method for forming resistive random access memory cell are provided. The method includes: providing a first voltage to a first word line connected to a first RRAM cell to form the first RRAM cell; and providing a negative voltage to a second word line connected to a second RRAM cell that shares a first source line and a first bit line with the first RRAM cell. An exemplary device includes: a first RRAM cell, a second RRAM cell, a first voltage source and a charge pump circuit. The first RRAM cell is connected to a first word line. The second RRAM cell is connected to a second word line. The first voltage source provides a first voltage to the first word line to form the first RRAM cell. The charge pump circuit provides a negative voltage to the second word line.
Public/Granted literature
- US20150085558A1 DEVICE AND METHOD FOR FORMING RESISTIVE RANDOM ACCESS MEMORY CELL Public/Granted day:2015-03-26
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