Invention Grant
US09287145B2 Substrate treatment system, substrate transfer method, and a non-transitory computer storage medium
有权
底物处理系统，底物转移方法和非暂时计算机存储介质
- Patent Title: Substrate treatment system, substrate transfer method, and a non-transitory computer storage medium
- Patent Title (中): 底物处理系统，底物转移方法和非暂时计算机存储介质
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Application No.: US13663179Application Date: 2012-10-29
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Publication No.: US09287145B2Publication Date: 2016-03-15
- Inventor: Masahiro Nakaharada , Yoji Sakata , Akira Miyata , Shinichi Hayashi , Suguru Enokida , Tsunenaga Nakashima
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2011-242331 20111104; JP2011-242336 20111104
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677 ; H01L21/687
Abstract:
In a coating and developing treatment system including a treatment station and an interface station, the interface station has: a cleaning unit cleaning a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting whether the cleaned wafer is in an exposable state; and a wafer transfer mechanism including an arm transferring the wafer between the cleaning unit and the inspection unit. Each of the cleaning unit and the inspection unit is provided at multiple tiers in an up and down direction on the front side in the interface station, and the wafer transfer mechanism is provided in a region adjacent to the cleaning units and the inspection units.
Public/Granted literature
- US20130112223A1 SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND A NON-TRANSITORY COMPUTER STORAGE MEDIUM Public/Granted day:2013-05-09
Information query
IPC分类:
