Invention Grant
- Patent Title: Lithographic apparatus
- Patent Title (中): 平版印刷设备
-
Application No.: US12484812Application Date: 2009-06-15
-
Publication No.: US09307624B2Publication Date: 2016-04-05
- Inventor: Denis Alexandrovich Glushkov , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Givi Georgievich Zukakishvili , Vladimir Mihailovitch Krivtsun , Yurii Victorovitch Sidelnikov , Kurt Gielissen , Oleg Yakushev
- Applicant: Denis Alexandrovich Glushkov , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Givi Georgievich Zukakishvili , Vladimir Mihailovitch Krivtsun , Yurii Victorovitch Sidelnikov , Kurt Gielissen , Oleg Yakushev
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G21K5/04
- IPC: G21K5/04 ; H05G2/00 ; G03F7/20
Abstract:
A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
Public/Granted literature
- US20100002211A1 LITHOGRAPHIC APPARATUS Public/Granted day:2010-01-07
Information query
