- 专利标题: Luminescent device and manufacturing method for luminescent device and semiconductor device
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申请号: US14725635申请日: 2015-05-29
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公开(公告)号: US09318653B2公开(公告)日: 2016-04-19
- 发明人: Yoshitaka Kadowaki , Tatsunori Toyota
- 申请人: DOWA ELECTRONICS MATERIALS CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: DOWA ELECTRONICS MATERIALS CO., LTD.
- 当前专利权人: DOWA ELECTRONICS MATERIALS CO., LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2011-007083 20110117
- 主分类号: H01L27/15
- IPC分类号: H01L27/15 ; H01L33/12 ; H01L33/00 ; H01L33/02 ; H01L33/10 ; H01L33/32 ; H01L33/46 ; H01S5/042 ; H01S5/323
摘要:
A luminescent device and a manufacturing method for the luminescent device and a semiconductor device which are free from occurrence of cracks in a compound semiconductor layer due to the internal stress in the compound semiconductor layer at the time of chemical lift-off. The luminescent device manufacturing method includes forming a device region on part of an epitaxial substrate through a lift-off layer; forming a sacrificing portion, being not removed in a chemical lift-off step, around device region on epitaxial substrate; covering epitaxial substrate and semiconductor layer and forming a covering layer such that level of surface thereof in the region away from device region is lower than luminescent layer surface; removing covering layer on semiconductor layer, and that on sacrificing portion surface; forming a reflection layer on covering layer surface and semiconductor layer surface; and forming a supporting substrate by providing plating on reflection layer.
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