Method of manufacturing optical semiconductor device and optical semiconductor device

    公开(公告)号:US12113155B2

    公开(公告)日:2024-10-08

    申请号:US17754113

    申请日:2020-09-18

    IPC分类号: H01L33/48 H01L33/62

    摘要: The method of manufacturing an optical semiconductor device includes: a mounting step of placing an optical semiconductor chip on a package substrate made of ceramic; a storing step of storing the package substrate after the mounting step in a first dry atmosphere; a placing step of subjecting the optical semiconductor chip on the package substrate to a second dry atmosphere and placing a light transparent window on a joint portion of the package substrate with a joint material therebetween; and a sealing step of joining the joint portion and the light transparent window with the joint material in a low oxygen concentration atmosphere having an oxygen concentration of 1 vol % or less, thereby encapsulating the optical semiconductor chip in a confined space formed by the package substrate and the light transparent window.

    METHOD OF PRODUCING GAAS WAFER, AND GAAS WAFER GROUP

    公开(公告)号:US20240162031A1

    公开(公告)日:2024-05-16

    申请号:US18550679

    申请日:2022-03-17

    发明人: Junji SUGIURA

    IPC分类号: H01L21/02 H01L29/20

    摘要: A method of producing a GaAs wafer having excellent OF orientation stability even in a GaAs wafer having an off angle, and a GaAs wafer group are provided. A method of producing a GaAs wafer includes: a grinding step of grinding a peripheral surface of a GaAs ingot including formation of a provisional orientation flat; a slicing step of slicing the GaAs ingot after the grinding step to cut out a material wafer having an off angle; and a cleaving step of applying marking to the material wafer according to an orientation of an orientation flat determined based on the provisional orientation flat and cleaving the material wafer toward a peripheral surface of the material wafer from the marking to form the orientation flat.

    Semiconductor light-emitting element and method of producing semiconductor light-emitting element

    公开(公告)号:US11888090B2

    公开(公告)日:2024-01-30

    申请号:US17418849

    申请日:2019-12-12

    IPC分类号: H01L33/06 H01L33/00 H01L33/30

    摘要: Provided is a semiconductor light-emitting element having improved light emission output. The semiconductor light-emitting element includes a light-emitting layer having a layered structure in which a first III-V compound semiconductor layer and a second III-V compound semiconductor layer having different composition ratios are repeatedly stacked. The first and second III-V compound semiconductor layers each contain three or more types of elements that are selected from Al, Ga, and In and from As, Sb, and P. The composition wavelength difference between the composition wavelength of the first III-V compound semiconductor layer and the composition wavelength of the second III-V compound semiconductor layer is 50 nm or less. The ratio of the lattice constant difference between the lattice constant of the first III-V compound semiconductor layer and the lattice constant of the second III-V compound semiconductor layer is not less than 0.05% and not more than 0.60%.

    SEMICONDUCTOR LIGHT-EMITTING ELEMENT

    公开(公告)号:US20230114703A1

    公开(公告)日:2023-04-13

    申请号:US18045831

    申请日:2022-10-12

    摘要: A semiconductor light-emitting element comprises, in this order, a substrate, a reflective layer, a first conductivity type cladding layer made of InGaAsP containing at least In and P, a semiconductor light-emitting layer having an emission central wavelength of 1000 nm to 2200 nm and a second conductivity type cladding layer made of InGaAsP containing at least In and P, the second conductivity type cladding layer being configured to be on a light extraction side, a surface of a light extraction face of the second conductivity type cladding layer being a roughened surface which has a surface roughness Ra of 0.03 μm or more and has a random irregularity pattern. The surface of the light extraction face has a skewness Rsk of −1 or more, and a protective film is provided on the light extraction face.