Invention Grant
- Patent Title: Method of forming a semiconductor socket
- Patent Title (中): 形成半导体插座的方法
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Application No.: US13319158Application Date: 2010-06-15
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Publication No.: US09320144B2Publication Date: 2016-04-19
- Inventor: James Rathburn
- Applicant: James Rathburn
- Applicant Address: US MN Maple Grove
- Assignee: HSIO Technologies, LLC
- Current Assignee: HSIO Technologies, LLC
- Current Assignee Address: US MN Maple Grove
- International Application: PCT/US2010/038606 WO 20100615
- International Announcement: WO2010/147939 WO 20101223
- Main IPC: H05K3/00
- IPC: H05K3/00 ; H05K1/14 ; H01R12/57 ; H05K3/34 ; H01R12/52

Abstract:
A semiconductor socket including a substrate with a plurality of through holes extending from a first surface to a second surface. A plurality of discrete contact members are located in the plurality of the through holes. The plurality of contact members each include a proximal end accessible from the second surface, and a distal end extending above the first surface. At least one dielectric layer is bonded to the second surface of the substrate with recesses corresponding to target circuit geometry. A conductive material deposited in at least a portion of the recesses to form conductive traces redistributing terminal pitch of the proximal ends of the contact members.
Public/Granted literature
- US20120051016A1 SEMICONDUCTOR SOCKET Public/Granted day:2012-03-01
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