Invention Grant
US09322061B2 Nanochannel device with three dimensional gradient by single step etching for molecular detection
有权
具有三维梯度的纳米通道器件通过单步蚀刻进行分子检测
- Patent Title: Nanochannel device with three dimensional gradient by single step etching for molecular detection
- Patent Title (中): 具有三维梯度的纳米通道器件通过单步蚀刻进行分子检测
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Application No.: US14199248Application Date: 2014-03-06
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Publication No.: US09322061B2Publication Date: 2016-04-26
- Inventor: Jingwei Bai , Qinghuang Lin , Gustavo A. Stolovitzky , Chao Wang , Deqiang Wang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: C12Q1/68
- IPC: C12Q1/68
Abstract:
A technique includes forming a gradient channel with width and depth gradients. A mask is disposed on top of a substrate. The mask is patterned with at least one elongated channel pattern having different elongated channel pattern widths. A channel is etched in the substrate in a single etching step, the channel having a width gradient and a corresponding depth gradient both simultaneously etched in the single etching step according to the different elongated channel pattern widths in the mask.
Public/Granted literature
- US20150252414A1 NANOCHANNEL DEVICE WITH THREE DIMENSIONAL GRADIENT BY SINGLE STEP ETCHING FOR MOLECULAR DETECTION Public/Granted day:2015-09-10
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