发明授权
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US14467146申请日: 2014-08-25
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公开(公告)号: US09324787B2公开(公告)日: 2016-04-26
- 发明人: Chiharu Ota , Tatsuo Shimizu , Johji Nishio , Takashi Shinohe
- 申请人: Kabushiki Kaisha Toshiba
- 申请人地址: JP Minato-ku
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2013-182595 20130903
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/78 ; H01L29/36 ; H01L29/861 ; H01L29/872 ; H01L29/16 ; H01L29/167 ; H01L29/66 ; H01L29/04
摘要:
According to one embodiment, a semiconductor device includes a first semiconductor region, a second semiconductor region, a third semiconductor region, and a first electrode. The first semiconductor region is of a first conductivity type. The second semiconductor region is provided on the first semiconductor region, and is of a second conductivity type. The third semiconductor region is provided on the second semiconductor region, and is of the second conductivity type. The third semiconductor region contains a first impurity of the first conductivity type and a second impurity of the second conductivity type, and satisfies 1
公开/授权文献
- US20150060884A1 SEMICONDUCTOR DEVICE 公开/授权日:2015-03-05
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