Invention Grant
- Patent Title: Surface pre-treatment for hard mask fabrication
- Patent Title (中): 硬掩模制造的表面预处理
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Application No.: US14102072Application Date: 2013-12-10
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Publication No.: US09330915B2Publication Date: 2016-05-03
- Inventor: Shing-Chyang Pan , Ching-Hua Hsieh , Hong-Hui Hsu , Yao-Jen Chang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01L21/033
- IPC: H01L21/033 ; H01L21/768 ; H01L23/532

Abstract:
A robust metallization profile is formed by pre-treat an anti-reflective coating layer by plasma before forming a hard mask layer. Pre-treatment is helpful especially in small feature size process, for example, 50 nm and below. By changing constitution of a surface layer of the anti-reflective coating, interface of the anti-reflective coating layer and the hard mask layer is smoothed which results in less overhang and better gap-filling performance.
Public/Granted literature
- US20150162280A1 Surface Pre-Treatment for Hard Mask Fabrication Public/Granted day:2015-06-11
Information query
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