Invention Grant
US09335624B2 Multi-patterning system and method using pre-coloring or locked patterns
有权
多图案化系统和使用预着色或锁定图案的方法
- Patent Title: Multi-patterning system and method using pre-coloring or locked patterns
- Patent Title (中): 多图案化系统和使用预着色或锁定图案的方法
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Application No.: US14277108Application Date: 2014-05-14
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Publication No.: US09335624B2Publication Date: 2016-05-10
- Inventor: Hui Yu Lee , Chi-Wen Chang , Chih Ming Yang , Ya Yun Liu , Yi-Kan Cheng
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Agent Steven E. Koffs
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/00

Abstract:
A non-transitory, computer readable storage medium is encoded with computer program instructions, such that, when the computer program instructions are executed by a computer, the computer performs a method. The method generates mask assignment information for forming a plurality of patterns on a layer of an integrated circuit (IC) by multipatterning. The mask assignment information includes, for each of the plurality of patterns, a mask assignment identifying which of a plurality of masks is to be used to form that pattern, and a mask assignment lock state for that pattern. User inputs setting the mask assignment of at least one of the plurality of patterns, and its mask assignment lock state are received. A new mask assignment is generated for each of the plurality of patterns having an “unlocked” mask assignment lock state.
Public/Granted literature
- US20150121317A1 MULTI-PATTERNING SYSTEM AND METHOD Public/Granted day:2015-04-30
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