Invention Grant
US09335631B2 Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer
有权
光敏树脂组合物，使用该组合物制造有机层的方法，以及包含该有机层的显示装置
- Patent Title: Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer
- Patent Title (中): 光敏树脂组合物，使用该组合物制造有机层的方法，以及包含该有机层的显示装置
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Application No.: US14446282Application Date: 2014-07-29
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Publication No.: US09335631B2Publication Date: 2016-05-10
- Inventor: Ki-Beom Lee , Sang-Hyun Yun , Hi-Kuk Lee , Jae-Hyuk Chang , Chang-Hoon Kim , Jung-In Park
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2013-0156139 20131216
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; G03F7/40 ; C08F220/30
Abstract:
A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.
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