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公开(公告)号：US09406630B2
公开(公告)日：2016-08-02
申请号：US14579542
申请日：2014-12-22
发明人： Joo-Han Kim , Ki-Yong Song , Dong-Ju Yang , Hee-Joon Kim , Yeo-Geon Yoon , Sung-Hen Cho , Chang-Hoon Kim , Jae-Hong Kim , Yu-Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Ji-Young Park
IPC分类号： H01L23/00 , G02F1/1362 , H01L27/12
CPC分类号： H01L24/05 , G02F1/136227 , H01L27/12 , H01L27/1214 , H01L27/124 , H01L2224/04042 , H01L2924/14 , H01L2924/1426 , H01L2924/00
摘要： A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.
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2.发明申请公开(公告)号：US20130302727A1
公开(公告)日：2013-11-14
申请号：US13655597
申请日：2012-10-19
发明人： Ki-Beom LEE , Su-Yeon Sim , Jae-Hyuk Chang , Chang-Hoon Kim , Hi-Kuk Lee
CPC分类号： G03F7/2051 , G03F7/0007 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/105
摘要： Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.
摘要翻译： 本发明的示例性实施方案涉及光致抗蚀剂组合物和使用其形成滤色器的方法。 根据示例性实施方案的光致抗蚀剂组合物包含约5重量％至约10重量％的粘合剂树脂，约5重量％至约10重量％的单体，约1重量％至约15重量％ 光引发剂的重量被配置为激活具有约400nm至约410nm的峰值波长的光，约1重量％至约10重量％的颜料，约0.01重量％至约1重量％ 的颜料分散剂和溶剂。
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公开(公告)号：US09594307B2
公开(公告)日：2017-03-14
申请号：US14226621
申请日：2014-03-26
发明人： Cha-Dong Kim , Hoon Kang , Chang-Hoon Kim , Sang-Hyun Yun , Jung-In Park , Woo-Yong Sung , Ki-Beom Lee , Hi-Kuk Lee , Jae-Hyuk Chang
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/7055
摘要： An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.
摘要翻译： 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。
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4.发明授权公开(公告)号：US08980528B2
公开(公告)日：2015-03-17
申请号：US13765132
申请日：2013-02-12
发明人： Ki-Beom Lee , Chang-Hoon Kim , Su-Yeon Sim , Sang-Hyn Lee , Hi-Kuk Lee
CPC分类号： G03F7/033 , G03F7/0007 , G03F7/028 , G03F7/029 , G03F7/031 , G03F7/032 , G03F7/105 , G03F7/20 , G03F7/2051
摘要： A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.
摘要翻译： 一种光致抗蚀剂组合物，其包含：约5重量％至约10重量％的粘合剂树脂; 约5重量％至约10重量％的光聚合单体; 约1重量％至约5重量％的光引发剂，其由具有约400nm至约410nm的峰值波长的光活化; 约5重量％至约10重量％的黑色着色剂，各自基于光致抗蚀剂组合物的总重量; 和溶剂。
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公开(公告)号：US09690204B2
公开(公告)日：2017-06-27
申请号：US14664770
申请日：2015-03-20
发明人： Sang-Hyun Lee , Hyun-Seok Kim , Jung-Chul Heo , Hi-Kuk Lee , Sang-Hyun Yun , Ki-Beom Lee , Chang-Hoon Kim , Jung-In Park , Kab-Jong Seo , Jun-Ho Sim , Jae-Hyuk Chang
IPC分类号： G03B27/44 , G03B27/68 , G03F7/20 , H01L29/786 , H01L27/12 , H01L29/417
CPC分类号： G03F7/70291 , G03F7/70508 , H01L27/124 , H01L27/1285 , H01L29/41733 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
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6.发明授权Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method 有权无掩模曝光装置，无掩模曝光方法和由无掩模曝光装置制造的显示基板和无掩模曝光方法公开(公告)号：US09436098B2
公开(公告)日：2016-09-06
申请号：US14635339
申请日：2015-03-02
发明人： Jung-Chul Heo , Hi-Kuk Lee , Jae-Hyuk Chang , Sang-Hyun Lee , Jung-In Park , Sang-Hyun Yun , Ki-Beom Lee , Hyun-Seok Kim , Kab-Jong Seo , Jun-Ho Sim , Byoung-Min Yun , Sang-Don Jang , Jae-Young Jang , Chang-Hoon Kim
IPC分类号： G03F7/20 , H01L29/786 , H01L27/12
CPC分类号： G03F7/70508 , G03F7/2022 , G03F7/2051 , G03F7/702 , G03F7/70291 , G03F7/70391 , H01L27/1222 , H01L27/124 , H01L27/1259 , H01L29/78669 , H01L29/78693 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
摘要翻译： 无掩模曝光装置包括具有数字微镜装置的曝光头。 数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。 系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。 图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。 图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。
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7.发明授权公开(公告)号：US09023558B2
公开(公告)日：2015-05-05
申请号：US13655597
申请日：2012-10-19
发明人： Ki-Beom Lee , Su-Yeon Sim , Jae-Hyuk Chang , Chang-Hoon Kim , Hi-Kuk Lee
CPC分类号： G03F7/2051 , G03F7/0007 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/105
摘要： Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.
摘要翻译： 本发明的示例性实施方案涉及光致抗蚀剂组合物和使用其形成滤色器的方法。 根据示例性实施方案的光致抗蚀剂组合物包含约5重量％至约10重量％的粘合剂树脂，约5重量％至约10重量％的单体，约1重量％至约15重量％ 光引发剂的重量被配置为激活具有约400nm至约410nm的峰值波长的光，约1重量％至约10重量％的颜料，约0.01重量％至约1重量％ 的颜料分散剂和溶剂。
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8.发明授权公开(公告)号：US09921488B2
公开(公告)日：2018-03-20
申请号：US14612648
申请日：2015-02-03
发明人： Jun-Ho Sim , Jung-In Park , Ki-Beom Lee , Hi-Kuk Lee , Hyun-Seok Kim , Kab-Jong Seo , Sang-Hyun Yun , Sang-Hyun Lee , Jung-Chul Heo , Jong-Joo Kim , Chang-Hoon Kim
CPC分类号： G03F7/70641 , G02B26/0833 , G03F7/2053 , G03F7/70291 , G03F7/70383 , G03F7/70391
摘要： A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
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9.发明申请MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD 有权无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法公开(公告)号：US20160054660A1
公开(公告)日：2016-02-25
申请号：US14664770
申请日：2015-03-20
发明人： Sang-Hyun Lee , Hyun-Seok Kim , Jung-Chul Heo , Hi-Kuk Lee , Sang-Hyun Yun , Ki-Beom Lee , Chang-Hoon Kim , Jung-In Park , Kab-Jong Seo , Jun-Ho Sim , Jae-Hyuk Chang
IPC分类号： G03F7/20 , H01L27/12 , H01L29/786
CPC分类号： G03F7/70291 , G03F7/70508 , H01L27/124 , H01L27/1285 , H01L29/41733 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
摘要翻译： 无掩模曝光装置包括具有数字微镜装置的曝光头，数字微镜装置被配置为通过反射来自曝光源的源光束将曝光光束扫描到衬底; 以及系统控制部，被配置为通过利用图形数据系统文件来控制数字微镜装置。 图形数据系统文件在平面图中包括源电极，漏电极和源极和漏电极之间的沟道部分的数据。 通道部分包括沿垂直于曝光头的扫描方向的方向延伸的第一部分。 通道部分的第一部分的宽度被定义为曝光光束的脉冲事件产生的倍数。
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10.发明授权Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer 有权光敏树脂组合物，使用该组合物制造有机层的方法，以及包含该有机层的显示装置公开(公告)号：US09335631B2
公开(公告)日：2016-05-10
申请号：US14446282
申请日：2014-07-29
发明人： Ki-Beom Lee , Sang-Hyun Yun , Hi-Kuk Lee , Jae-Hyuk Chang , Chang-Hoon Kim , Jung-In Park
IPC分类号： G03F7/004 , G03F7/038 , G03F7/40 , C08F220/30
CPC分类号： G03F7/0388 , C08F220/30 , C08F2220/301 , C08F2220/303 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0392 , G03F7/40
摘要： A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.
摘要翻译： 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。
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