Invention Grant
US09336980B2 Electron beam writing apparatus, and method for adjusting convergence half angle of electron beam
有权
电子束写入装置,以及用于调整电子束的会聚半角的方法
- Patent Title: Electron beam writing apparatus, and method for adjusting convergence half angle of electron beam
- Patent Title (中): 电子束写入装置,以及用于调整电子束的会聚半角的方法
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Application No.: US14663971Application Date: 2015-03-20
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Publication No.: US09336980B2Publication Date: 2016-05-10
- Inventor: Haruyuki Nomura
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-085050 20140416
- Main IPC: H01J37/10
- IPC: H01J37/10 ; H01J37/147 ; H01J37/04

Abstract:
An electron beam writing apparatus includes an electron gun system to emit an electron beam, a height adjustment unit, arranged at the downstream side compared to the electron gun system with respect to the optical axis direction, to variably adjust a height position of the electron gun system, an electron lens, arranged at the downstream side compared to the height adjustment unit with respect to the optical axis direction, to converge the electron beam, a lens control unit to control, for each variably adjusted and changed height position of the electron gun system, the electron lens such that the electron beam forms a crossover at a predetermined position, and an objective lens, arranged at the downstream side compared to the electron lens with respect to the optical axis direction, to focus the electron beam having passed the electron lens.
Public/Granted literature
- US20150303026A1 ELECTRON BEAM WRITING APPARATUS, AND METHOD FOR ADJUSTING CONVERGENCE HALF ANGLE OF ELECTRON BEAM Public/Granted day:2015-10-22
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