Invention Grant
- Patent Title: Multi charged particle beam writing apparatus and multi charged particle beam writing method
- Patent Title (中): 多带电粒子束写入装置和多带电粒子束写入方法
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Application No.: US14528652Application Date: 2014-10-30
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Publication No.: US09343268B2Publication Date: 2016-05-17
- Inventor: Ryoichi Yoshikawa , Munehiro Ogasawara
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: Nuflare Technology, Inc.
- Current Assignee: Nuflare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-190957 20110901
- Main IPC: H01L21/263
- IPC: H01L21/263 ; H01J37/317 ; H01J37/302 ; B82Y10/00 ; B82Y40/00 ; H01L21/308
Abstract:
In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.
Public/Granted literature
- US20150064934A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2015-03-05
Information query
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