Invention Grant
- Patent Title: Liquid processing apparatus and liquid processing method
- Patent Title (中): 液体处理装置和液体处理方法
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Application No.: US13680426Application Date: 2012-11-19
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Publication No.: US09346084B2Publication Date: 2016-05-24
- Inventor: Shuichi Nagamine , Yusuke Hashimoto
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2011-254269 20111121
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B3/10 ; B08B3/12

Abstract:
Disclosed is a liquid processing apparatus capable of performing a liquid processing and a drying processing in a position each having a different height. The liquid processing apparatus includes: a substrate holding unit configured to hold a substrate; a rotation driving unit configured to rotate the substrate holding unit; a substrate holding unit elevating member configured to lift and lower the substrate holding unit; a processing liquid supply unit configured to supply a processing liquid to the substrate; a liquid receiving cup configured to surround the substrate when the processing liquid is being supplied to the substrate; a drying cup located above the substrate and the liquid receiving cup when the processing liquid is being supplied to the substrate. The drying cup surrounds the substrate and located above the liquid receiving cup when the substrate is being dried.
Public/Granted literature
- US20130125931A1 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD Public/Granted day:2013-05-23
Information query
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