发明授权
- 专利标题: Multi-electrode stack arrangement
- 专利标题(中): 多电极堆叠布置
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申请号: US14541238申请日: 2014-11-14
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公开(公告)号: US09355751B2公开(公告)日: 2016-05-31
- 发明人: Willem Henk Urbanus , Marco Jan-Jaco Wieland
- 申请人: MAPPER LITHOGRAPHY IP B.V.
- 申请人地址: NL Delft
- 专利权人: MAPPER LITHOGRAPHY IP B.V.
- 当前专利权人: MAPPER LITHOGRAPHY IP B.V.
- 当前专利权人地址: NL Delft
- 代理机构: Hoyng Rock Monegier LLP
- 代理商 David P. Owen
- 主分类号: G21K1/02
- IPC分类号: G21K1/02 ; G21K5/04 ; H01J37/24 ; H01J37/30 ; H01J37/317 ; H01J37/02 ; H01J37/16 ; H01J37/065 ; H01J37/12
摘要:
The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.
公开/授权文献
- US20150137010A1 MULTI-ELECTRODE STACK ARRANGEMENT 公开/授权日:2015-05-21
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