Invention Grant
- Patent Title: Extreme ultraviolet light source
- Patent Title (中): 极紫外光源
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Application No.: US14325153Application Date: 2014-07-07
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Publication No.: US09357625B2Publication Date: 2016-05-31
- Inventor: Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Andrew LaForge , Daniel Brown , Jason M. Arcand , Alexander A. Schafgans , Michael A. Purvis
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00
Abstract:
An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
Public/Granted literature
- US20160007434A1 EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2016-01-07
Information query
