Invention Grant
- Patent Title: Method of forming dual size microlenses for image sensors
- Patent Title (中): 形成图像传感器双尺寸微透镜的方法
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Application No.: US13860859Application Date: 2013-04-11
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Publication No.: US09372286B2Publication Date: 2016-06-21
- Inventor: Jin Li , Gang Chen , Yin Qian , Hsin-Chih Tai
- Applicant: OmniVision Technologies, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: OmniVision Technologies, Inc.
- Current Assignee: OmniVision Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: B05D1/00
- IPC: B05D1/00 ; G02B3/00 ; B29D11/00

Abstract:
A method of forming microlenses for an image sensor having at least one large-area pixel and at least one small-area pixel is disclosed. The method includes forming a uniform layer of microlens material on a light incident side of the image sensor over the large-area pixel and over the small-area pixel. The method also includes forming the layer of microlens material into a first block disposed over the large-area pixel and into a second block disposed over the small-area pixel. A void is also formed in the second block to reduce a volume of microlens material included in the second block. The first and second blocks are then reflowed to form a respective first microlens and second microlens. The first microlens has substantially the same effective focal length as the second microlens.
Public/Granted literature
- US20140306360A1 METHOD OF FORMING DUAL SIZE MICROLENSES FOR IMAGE SENSORS Public/Granted day:2014-10-16
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