Invention Grant
US09373720B2 Three-dimensional transistor with improved channel mobility 有权
具有改善信道移动性的三维晶体管

Three-dimensional transistor with improved channel mobility
Abstract:
The present invention relates to a semiconductor structure comprising at least a first and a second three-dimensional transistor, wherein the first transistor and the second transistor are electrically connected in parallel to each other, and wherein each transistor comprises a source and a drain, wherein the source and/or drain of the first transistor is at least partially separated from, respectively, the source and/or drain of the second transistor. The invention further relates to a process for realizing such a semiconductor structure.
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