Invention Grant
- Patent Title: Memory device and method of fabricating the same
- Patent Title (中): 存储器件及其制造方法
-
Application No.: US14600577Application Date: 2015-01-20
-
Publication No.: US09379122B2Publication Date: 2016-06-28
- Inventor: Jin-Hyun Shin , Jae-Bok Baek
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Onello & Mello, LLP
- Priority: KR10-2014-0075034 20140619
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L29/788 ; H01L29/06 ; H01L21/764 ; G11C5/06 ; G11C16/04

Abstract:
A memory device includes an array of floating gate memory cells. Adjacent memory cells are separated by a plurality of air gaps that electrically decouple respective active regions of adjacent memory cells from one another. Additionally, the air gaps electrically decouple an active region of a memory cell from a floating gate of an adjacent memory cell.
Public/Granted literature
- US20150371996A1 MEMORY DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2015-12-24
Information query
IPC分类: