Invention Grant
- Patent Title: Selective etching of a matrix comprising silver nano wires
- Patent Title (中): 选择性蚀刻包含银纳米线的基体
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Application No.: US14354743Application Date: 2012-09-28
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Publication No.: US09379326B2Publication Date: 2016-06-28
- Inventor: Werner Stockum , Oliver Doll , Ingo Koehler , Christian Matuschek
- Applicant: MERCK PATENT GmbH
- Applicant Address: DE Darmstadt
- Assignee: MERCK PATENT GMBH
- Current Assignee: MERCK PATENT GMBH
- Current Assignee Address: DE Darmstadt
- Agency: Millen, White, Zelano, Branigan, P.C.
- Priority: EP11008621 20111027
- International Application: PCT/EP2012/004095 WO 20120928
- International Announcement: WO2013/060409 WO 20130502
- Main IPC: H01B13/00
- IPC: H01B13/00 ; C03C25/68 ; H01L51/00 ; H01B1/22 ; H01L51/10 ; H01L51/52 ; H01L33/42 ; H01L31/18 ; C09K13/06 ; C23F1/00 ; C23F1/30 ; C23F1/02
Abstract:
The present invention refers to a method for selectively structuring of a polymer matrix comprising AgNW (silver nano wires) or CNTs (carbon nano tubes) or comprising mixtures of AgNW and CNTs on a flexible plastic substructure or solid glass sheet. The method also includes a suitable etching composition, which allows to proceed the method in a mass production.
Public/Granted literature
- US20140291287A1 SELECTIVE ETCHING OF A MATRIX COMPRISING SILVER NANO WIRES Public/Granted day:2014-10-02
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