Invention Grant
- Patent Title: Support cylinder for thermal processing chamber
- Patent Title (中): 支撑筒用于热处理室
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Application No.: US14298389Application Date: 2014-06-06
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Publication No.: US09385004B2Publication Date: 2016-07-05
- Inventor: Mehran Behdjat , Aaron Muir Hunter , Joseph M. Ranish , Norman Tam , Jeffrey Tobin , Jiping Li , Martin Tran
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/324 ; F16C13/00 ; B05D7/22 ; H01L21/67 ; H01L21/687

Abstract:
Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder comprises a ring body having an inner peripheral surface and an outer peripheral surface, wherein the ring body comprises an opaque quartz glass material and wherein the ring body is coated with an optical transparent layer. The optical transparent layer has a coefficient of thermal expansion that is substantially matched or similar to the opaque quartz glass material to reduce thermal expansion mismatch that may cause thermal stress under high thermal loads. In one example, the opaque quartz glass material is synthetic black quartz and the optical transparent layer comprises a clear fused quartz material.
Public/Granted literature
- US20150050819A1 SUPPORT CYLINDER FOR THERMAL PROCESSING CHAMBER Public/Granted day:2015-02-19
Information query
IPC分类: