Invention Grant
- Patent Title: Passivated microelectromechanical structures and methods
- Patent Title (中): 钝化微机电结构和方法
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Application No.: US14502255Application Date: 2014-09-30
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Publication No.: US09395533B2Publication Date: 2016-07-19
- Inventor: Teruo Sasagawa
- Applicant: Pixtronix, Inc.
- Applicant Address: US CA San Diego
- Assignee: Pixtronix, Inc.
- Current Assignee: Pixtronix, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: G01P15/08
- IPC: G01P15/08 ; G02B26/02 ; B81C1/00 ; G09G5/10 ; G02B26/08

Abstract:
This disclosure provides systems, methods and apparatus including devices that include a layer of passivation material covering at least a portion of an exterior surface of a thin film component within a microelectomechanical device. The thin film component may include an electrically conductive layer that connects via an anchor to a conductive surface on a substrate. The disclosure further provides processes for providing a layer of passivation material on an exterior surface of a thin film component and for electrically connecting that thin film component to a conductive surface on a substrate.
Public/Granted literature
- US20160091713A1 PASSIVATED MICROELECTROMECHANICAL STRUCTURES AND METHODS Public/Granted day:2016-03-31
Information query
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