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US09395619B2 Phase shift mask, patterning method using the same and method of manufacturing display panel using the same 有权
相移掩模，使用其的图案化方法以及使用其的显示面板的制造方法

Phase shift mask, patterning method using the same and method of manufacturing display panel using the same
Abstract:
A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
Abstract(Chinese):

相移装置包括：包括透明基板的相移掩模和设置在透明基板上的相移图案，并且包括具有第一厚度的第一区域，第二区域的第二厚度小于 第一厚度，具有第一开口宽度并限定在第一区域的第一开口，以及具有第二开口宽度并限定在第二区域的第二开口。

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