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    PATTERNING METHOD USING SURFACE PLASMON
    1.
    发明申请
    PATTERNING METHOD USING SURFACE PLASMON 有权
    使用表面等离子体的方法

    公开(公告)号：US20150234286A1

    公开(公告)日：2015-08-20

    申请号：US14444255

    申请日：2014-07-28

    Applicant: Samsung Display Co., Ltd.

    Inventor： Yong Son ,  Min Kang ,  Bong-Yeon Kim ,  Dong-Eon Lee ,  Hyun-joo Lee

    IPC: G03F7/40 ,  G03F7/16

    CPC classification number: G03F7/2016 ,  G03F7/70375

    Abstract: A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.

    Abstract translation: 形成精细图案的方法包括在基板上形成蚀刻目标材料层，在蚀刻靶材料层上形成第一光致抗蚀剂层，在第一光致抗蚀剂层上形成金属图案，金属图案具有多条线，薄 膜线交替布置，线具有预定的线宽和厚度并且彼此隔开预定距离，通过光照射激发金属图案中的表面等离子体激元，以产生表面等离子体共振，其在第一 光致抗蚀剂层，通过去除金属图案和显影第一光致抗蚀剂层形成第一光致抗蚀剂图案，并且通过使用第一光致抗蚀剂图案作为掩模来蚀刻蚀刻目标材料层。

    Patterning method using surface plasmon
    2.
    发明授权
    Patterning method using surface plasmon 有权
    使用表面等离子体的图案化方法

    公开(公告)号：US09436091B2

    公开(公告)日：2016-09-06

    申请号：US14444255

    申请日：2014-07-28

    Applicant: Samsung Display Co., Ltd.

    Inventor： Yong Son ,  Min Kang ,  Bong-Yeon Kim ,  Dong-Eon Lee ,  Hyun-joo Lee

    IPC: G03F7/20

    CPC classification number: G03F7/2016 ,  G03F7/70375

    Abstract: A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.

    Abstract translation: 一种形成精细图案的方法包括在基板上形成蚀刻目标材料层，在蚀刻靶材料层上形成第一光致抗蚀剂层，在第一光致抗蚀剂层上形成金属图案，金属图案具有多条线和薄的 薄膜线交替布置，线具有预定的线宽和厚度并且彼此隔开预定距离，通过光照射激发金属图案中的表面等离子体激元，以产生表面等离子体共振，其在第一 光致抗蚀剂层，通过去除金属图案和显影第一光致抗蚀剂层形成第一光致抗蚀剂图案，并且通过使用第一光致抗蚀剂图案作为掩模来蚀刻蚀刻目标材料层。

    PHOTO MASK AND METHOD OF MANUFACTURING THE SAME
    4.
    发明申请
    PHOTO MASK AND METHOD OF MANUFACTURING THE SAME 有权
    照片掩模及其制造方法

    公开(公告)号：US20160139504A1

    公开(公告)日：2016-05-19

    申请号：US14678743

    申请日：2015-04-03

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jun-Hyuk Woo ,  Jeong-Won Kim ,  Kwang-Woo Park ,  Dong-Eon Lee ,  Seung-Bo Shim ,  Jin-Ho Ju

    IPC: G03F1/80 ,  G03F1/38

    CPC classification number: G03F1/38 ,  G03F1/54 ,  G03F1/58 ,  G03F1/80 ,  G03F7/0007

    Abstract: A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.

    Abstract translation: 光掩模包括透明基板和掩模图案。 掩模图案设置在透明基板上。 掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。 发送部分与阻挡部分相邻。 阻挡部分包括第一阻挡层，光引导层和第二阻挡层。 第一阻挡层设置在透明基板上。 第一阻挡层透射光的一部分。 第一阻挡层包括多个阻挡图案，包括第一阻挡材料。 光引导层设置在第一阻挡层上。 光导层将光的透射部分引导到光导层的侧表面。 第二阻挡层反射光的透射部分。

    Photo mask and method of manufacturing the same
    5.
    发明授权
    Photo mask and method of manufacturing the same 有权
    照相面具及其制造方法

    公开(公告)号：US09575405B2

    公开(公告)日：2017-02-21

    申请号：US14678743

    申请日：2015-04-03

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jun-Hyuk Woo ,  Jeong-Won Kim ,  Kwang-Woo Park ,  Dong-Eon Lee ,  Seung-Bo Shim ,  Jin-Ho Ju

    IPC: G03F1/38 ,  G03F1/58 ,  G03F1/80 ,  G03F1/54 ,  G03F7/00

    CPC classification number: G03F1/38 ,  G03F1/54 ,  G03F1/58 ,  G03F1/80 ,  G03F7/0007

    Abstract: A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.

    Abstract translation: 光掩模包括透明基板和掩模图案。 掩模图案设置在透明基板上。 掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。 传送部分与阻挡部分相邻。 阻挡部分包括第一阻挡层，光引导层和第二阻挡层。 第一阻挡层设置在透明基板上。 第一阻挡层透射光的一部分。 第一阻挡层包括多个阻挡图案，包括第一阻挡材料。 光引导层设置在第一阻挡层上。 光导层将光的透射部分引导到光导层的侧表面。 第二阻挡层反射光的透射部分。

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