Invention Grant
- Patent Title: Semiconductor device assembly with underfill containment cavity
- Patent Title (中): 具有底部填充容纳腔的半导体器件组件
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Application No.: US14635888Application Date: 2015-03-02
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Publication No.: US09397078B1Publication Date: 2016-07-19
- Inventor: Anilkumar Chandolu , Wayne H. Huang , Sameer S. Vadhavkar
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L25/18
- IPC: H01L25/18 ; H01L23/367 ; H01L25/00 ; H01L23/48 ; H01L25/065 ; H01L21/56 ; H01L23/31

Abstract:
Semiconductor device assemblies with underfill containment cavities are disclosed herein. In one embodiment, a semiconductor device assembly can include a first semiconductor die having a base region formed from a substrate material, a recessed surface along the base region, a peripheral region formed from the substrate material and projecting from the base region, and a sidewall surface along the peripheral region and defining a cavity with the sidewall surface in the peripheral region. The semiconductor device assembly further includes a thermal transfer structure attached to the peripheral region of the first die adjacent the cavity, and an underfill material at least partially filling the cavity and including a fillet between the peripheral region and the stack of second semiconductor dies.
Information query
IPC分类: