Invention Grant
- Patent Title: Substrate structure
- Patent Title (中): 基材结构
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Application No.: US14480260Application Date: 2014-09-08
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Publication No.: US09398690B2Publication Date: 2016-07-19
- Inventor: Chia-Cheng Liu , Chia-Hsiung Chang , An-Chang Wang , Chao-Hsiang Wang , Yang-Chen Chen
- Applicant: INNOLUX CORPORATION
- Applicant Address: TW Jhu-Nan
- Assignee: INNOLUX CORPORATION
- Current Assignee: INNOLUX CORPORATION
- Current Assignee Address: TW Jhu-Nan
- Agency: Liu & Liu
- Priority: TW103123525A 20140708
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/492 ; H05K1/11 ; H05K1/09

Abstract:
A substrate structure includes a first substrate, a plurality of first bonding pads and a connecting layer. The first substrate has an element configuration area and a peripheral area. The peripheral area is disposed around the element configuration area. The first bonding pads are configured spacing at the peripheral area, and a gap is provided between two adjacent first bonding pads. The connecting layer is disposed on the first substrate and covers the first bonding pads and the gaps. The part of the connecting layer close to the element configuration area is configured with a plurality of first arc edges.
Public/Granted literature
- US20160014895A1 SUBSTRATE STRUCTURE Public/Granted day:2016-01-14
Information query
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