Invention Grant
- Patent Title: Integrated circuit product with a gate height registration structure
- Patent Title (中): 具有门高度注册结构的集成电路产品
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Application No.: US14855881Application Date: 2015-09-16
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Publication No.: US09412740B2Publication Date: 2016-08-09
- Inventor: Ruilong Xie , Michael Wedlake , Xiuyu Cai , Ali Khakifirooz , Kangguo Cheng
- Applicant: GLOBALFOUNDRIES Inc. , International Business Machines Corporation
- Applicant Address: KY Grand Cayman US NY Armonk
- Assignee: GLOBALFOUNDRIES Inc.,International Business Machines Corporation
- Current Assignee: GLOBALFOUNDRIES Inc.,International Business Machines Corporation
- Current Assignee Address: KY Grand Cayman US NY Armonk
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/088 ; H01L21/8234 ; H01L29/66 ; H01L21/28 ; H01L21/321

Abstract:
One illustrative device disclosed includes, among other things, first and second active regions that are separated by an isolation region, first and second replacement gate structures positioned above the first and second active regions, respectively, and a gate registration structure positioned above the isolation region, wherein the gate registration structure comprises a layer of insulating material positioned above the isolation region and a polish-stop layer and wherein a first end surface of the first replacement gate structure abuts and engages a first side surface of the gate registration structure and a second end surface of the second replacement gate structure abuts and engages a second side surface of the gate registration structure.
Public/Granted literature
- US20160005733A1 INTEGRATED CIRCUIT PRODUCT WITH A GATE HEIGHT REGISTRATION STRUCTURE Public/Granted day:2016-01-07
Information query
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