Invention Grant
- Patent Title: Double anodizing processes
- Patent Title (中): 双阳极氧化工艺
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Application No.: US13610813Application Date: 2012-09-11
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Publication No.: US09420713B2Publication Date: 2016-08-16
- Inventor: Lucy Elizabeth Browning , Charles B. Woodhull , Bryan Patrick Kiple , David A. Pakula , Tang Yew Tan , Julie Hanchak-Connors , John Murray Thornton, III , Thomas Johannessen , Peter Russell-Clarke , Masashige Tatebe , Napthaneal Y. Tan
- Applicant: Lucy Elizabeth Browning , Charles B. Woodhull , Bryan Patrick Kiple , David A. Pakula , Tang Yew Tan , Julie Hanchak-Connors , John Murray Thornton, III , Thomas Johannessen , Peter Russell-Clarke , Masashige Tatebe , Napthaneal Y. Tan
- Applicant Address: US CA Cupertino
- Assignee: Apple Inc.
- Current Assignee: Apple Inc.
- Current Assignee Address: US CA Cupertino
- Agency: Downey Brand LLP
- Main IPC: C25D11/02
- IPC: C25D11/02 ; H05K5/04 ; B23P11/00 ; B23P17/00 ; G03F1/38 ; H01Q1/24 ; H04M1/02 ; H05K5/02 ; H05K13/00 ; C25D7/00 ; C25D11/12 ; H05K5/03 ; H01Q1/42 ; C25D11/34 ; B23C5/10 ; B23C5/00 ; B23P17/02 ; H04M1/11 ; C25D11/24

Abstract:
Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.
Public/Granted literature
- US20130319865A1 DOUBLE ANODIZING PROCESSES Public/Granted day:2013-12-05
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