Invention Grant
- Patent Title: High brightness X-ray absorption spectroscopy system
- Patent Title (中): 高亮度X射线吸收光谱系统
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Application No.: US14636994Application Date: 2015-03-03
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Publication No.: US09448190B2Publication Date: 2016-09-20
- Inventor: Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
- Applicant: Sigray, Inc.
- Applicant Address: US CA Concord
- Assignee: Sigray, Inc.
- Current Assignee: Sigray, Inc.
- Current Assignee Address: US CA Concord
- Agent Franklin Schellenberg
- Main IPC: H01J35/08
- IPC: H01J35/08 ; G01N23/207 ; H01J35/14 ; G01N23/06

Abstract:
This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.
Public/Granted literature
- US20150357069A1 HIGH BRIGHTNESS X-RAY ABSORPTION SPECTROSCOPY SYSTEM Public/Granted day:2015-12-10
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