Invention Grant
- Patent Title: Reflective mask blank and reflective mask, and methods for manufacturing reflective mask blank and reflective mask
- Patent Title (中): 反光罩和反光罩,以及反光罩和反光罩的制造方法
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Application No.: US14227705Application Date: 2014-03-27
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Publication No.: US09448468B2Publication Date: 2016-09-20
- Inventor: Masahito Tanabe , Norihito Fukugami , Yo Sakata , Tooru Komizo , Takashi Haraguchi
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2011-213244 20110928; JP2011-214573 20110929
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/22 ; G03F1/00

Abstract:
A reflective mask blank, a reflective mask, and methods for manufacturing those, which suppress reflectance at a light-shielding frame. The reflective mask includes a substrate, a multilayered reflective layer formed on the substrate, an absorption layer formed on the multilayered reflective layer, and a frame-shaped light-shielding frame area at which the absorption layer has a film thickness larger than a film thickness at other areas. The multilayered reflective layer is diffused and mixed at the light-shielding frame area through melting.
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