Invention Grant
- Patent Title: Split gate NAND flash memory structure and array, method of programming, erasing and reading thereof, and method of manufacturing
-
Application No.: US14318502Application Date: 2014-06-27
-
Publication No.: US09449693B2Publication Date: 2016-09-20
- Inventor: Yuniarto Widjaja , John W. Cooksey , Changyuan Chen , Feng Gao , Ya-Fen Lin , Dana Lee
- Applicant: Silicon Storage Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: Silicon Storage Technology, Inc.
- Current Assignee: Silicon Storage Technology, Inc.
- Current Assignee Address: US CA San Jose
- Agency: DLA Piper LLP (US)
- Main IPC: G11C16/10
- IPC: G11C16/10 ; G11C16/04 ; H01L21/28 ; H01L27/115 ; H01L29/423 ; H01L29/66 ; H01L29/788 ; G11C16/14

Abstract:
A split gate NAND flash memory structure is formed on a semiconductor substrate of a first conductivity type. The NAND structure comprises a first region of a second conductivity type in the substrate with a second region of the second conductivity type in the substrate, spaced apart from the first region. A continuous first channel region is defined between the first region and the second region. A plurality of floating gates are spaced apart from one another with each positioned over a separate portion of the channel region. A plurality of control gates are provided with each associated with and adjacent to a floating gate. Each control gate has two portions: a first portion over a portion of the channel region and a second portion over the associated floating gate and capacitively coupled thereto.
Public/Granted literature
Information query