Invention Grant
- Patent Title: X-ray illuminators with high flux and high flux density
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Application No.: US14544191Application Date: 2014-12-08
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Publication No.: US09449781B2Publication Date: 2016-09-20
- Inventor: Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
- Applicant: Sigray, Inc.
- Applicant Address: US CA Concord
- Assignee: Sigray, Inc.
- Current Assignee: Sigray, Inc.
- Current Assignee Address: US CA Concord
- Agent Franklin Schellenberg
- Main IPC: G21K1/06
- IPC: G21K1/06 ; H01J35/08 ; G01N23/223

Abstract:
This disclosure presents systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density.
Public/Granted literature
- US20150194287A1 X-ray illuminators with high flux and high flux density Public/Granted day:2015-07-09
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