Invention Grant
- Patent Title: In-situ annealing to improve the tunneling magneto-resistance of magnetic tunnel junctions
- Patent Title (中): 原位退火以改善磁隧道结的隧道磁阻
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Application No.: US15062725Application Date: 2016-03-07
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Publication No.: US09472754B2Publication Date: 2016-10-18
- Inventor: Guohan Hu , Daniel C. Worledge
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L29/96
- IPC: H01L29/96 ; H01L43/12 ; H01L27/105 ; H01L27/22

Abstract:
Embodiments are directed to a magnetic tunnel junction (MTJ) memory cell that includes a reference layer formed from a perpendicular magnetic anisotropy (PMA) reference layer and an interfacial reference layer. The MTJ further includes a free layer and a tunnel barrier positioned between the interfacial reference layer and the free layer. The tunnel barrier is configured to enable electrons to tunnel through the tunnel barrier between the interfacial reference layer and the free layer. A first in-situ alignment is provided between a tunnel barrier lattice structure of the tunnel barrier and an interfacial reference layer lattice structure of the interfacial reference layer. A second in-situ alignment is provided between the tunnel barrier lattice structure of the tunnel barrier and a free layer lattice structure of the free layer. The PMA reference layer lattice structure is not aligned with the interfacial reference layer lattice structure.
Public/Granted literature
- US20160190437A1 IN-SITU ANNEALING TO IMPROVE THE TUNNELING MAGNETO-RESISTANCE OF MAGNETIC TUNNEL JUNCTIONS Public/Granted day:2016-06-30
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