- 专利标题: Ion generator mounting device
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申请号: US14861469申请日: 2015-09-22
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公开(公告)号: US09478948B2公开(公告)日: 2016-10-25
- 发明人: Charles Houston Waddell
- 申请人: Global Plasma Solutions, LLC
- 申请人地址: US GA Savannah
- 专利权人: Global Plasma Solutions, LLC
- 当前专利权人: Global Plasma Solutions, LLC
- 当前专利权人地址: US GA Savannah
- 代理机构: Clements Bernard, PLLC
- 代理商 Seth L. Hudson
- 主分类号: H01T23/00
- IPC分类号: H01T23/00 ; B03C3/011 ; B03C3/41 ; F02M27/04 ; F16M13/02 ; H01J37/16 ; H01J37/30 ; A61L9/22 ; H01J27/02 ; F01N3/08 ; F02M35/02 ; F24F3/16
摘要:
The present invention provides methods and systems for an ion generator mounting device for application of bipolar ionization to airflow within a conduit, the device includes a housing for mounting to the conduit having an internal panel within the enclosure, and an arm extending from the housing for extension into the conduit and containing at least one opening. At least one coupling for mounting an ion generator to the arm oriented with an axis extending between a pair of electrodes of the ion generator being generally perpendicular to a flow direction of the airflow within the conduit.
公开/授权文献
- US20160013013A1 ION GENERATOR MOUNTING DEVICE 公开/授权日:2016-01-14
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