Invention Grant
US09482944B2 Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
有权
共聚物，包含所述共聚物的聚合物颗粒和用于负性辐射敏感平版印刷版的辐射敏感性涂料组合物的共聚物粘合剂
- Patent Title: Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
- Patent Title (中): 共聚物，包含所述共聚物的聚合物颗粒和用于负性辐射敏感平版印刷版的辐射敏感性涂料组合物的共聚物粘合剂
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Application No.: US13391363Application Date: 2010-09-14
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Publication No.: US09482944B2Publication Date: 2016-11-01
- Inventor: My T. Nguyen , Marc-Andre Locas
- Applicant: My T. Nguyen , Marc-Andre Locas
- Applicant Address: VN Travinh, Travinh Province
- Assignee: MYLAN GROUP
- Current Assignee: MYLAN GROUP
- Current Assignee Address: VN Travinh, Travinh Province
- Agency: Lathrop & Gage LLP
- Agent Brian C. Trinque
- International Application: PCT/CA2010/001400 WO 20100914
- International Announcement: WO2010/148520 WO 20101229
- Main IPC: C08F220/50
- IPC: C08F220/50 ; G03F7/029 ; C08F220/70 ; C08F220/60 ; B41C1/10 ; C07C233/18 ; C07C255/19 ; C07C255/33 ; C07C271/16 ; C07C271/28 ; C07C275/10 ; C07D207/40 ; C07D295/215 ; C07F9/09 ; C08F220/42 ; G03F7/027 ; G03F7/033 ; C08F212/08 ; C08F220/06 ; C08F230/02
Abstract:
There is provided a copolymer and polymeric particle comprising the copolymer, a method of producing a polymeric particle, a copolymeric binder, a method of producing a copolymeric binder, a near infrared radiation-sensitive coating composition, a negative working lithographic offset printing plate, a method of producing a negative working lithographic offset printing plate and methods of imaging the plate and printing with the imaged plate.
Public/Granted literature
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