Invention Grant
- Patent Title: Isolated global shutter pixel storage structure
- Patent Title (中): 隔离全球快门像素存储结构
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Application No.: US14524791Application Date: 2014-10-27
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Publication No.: US09484370B2Publication Date: 2016-11-01
- Inventor: Kevin Ka Kei Leung , Dajiang Yang
- Applicant: OMNIVISION TECHNOLOGIES, INC.
- Applicant Address: US CA Santa Clara
- Assignee: OmniVision Technologies, Inc.
- Current Assignee: OmniVision Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor& Zafman LLP
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A pixel cell includes a photodiode disposed in a semiconductor material to accumulate image charge in response to incident light directed to the photodiode. A global shutter gate transistor disposed in the semiconductor material and is coupled to the photodiode to selectively deplete the image charge from the photodiode. A storage transistor is disposed in the semiconductor material to store the image charge. An optical isolation structure is disposed in the semiconductor material proximate to the storage transistor to isolate a sidewall of the storage transistor from stray light and stray charge in the semiconductor material outside of the storage transistor. The optical isolation structure is filled with tungsten.
Public/Granted literature
- US20160118438A1 ISOLATED GLOBAL SHUTTER PIXEL STORAGE STRUCTURE Public/Granted day:2016-04-28
Information query
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