Invention Grant
- Patent Title: Method for manufacturing thin film transistor array panel
- Patent Title (中): 制造薄膜晶体管阵列面板的方法
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Application No.: US14740484Application Date: 2015-06-16
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Publication No.: US09490275B2Publication Date: 2016-11-08
- Inventor: Young Min Moon , Jong-Hyun Choung , Bong-Kyun Kim
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2015-0010711 20150122
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L29/00 ; H01L27/12 ; H01L29/51 ; H01L29/49 ; H01L29/78 ; H01L29/423

Abstract:
A thin film transistor array panel includes: a gate line on a substrate and including a gate electrode; a first gate insulating layer on the substrate and the gate line, the first gate insulting layer including a first portion adjacent to the gate line and a second portion overlapping the gate line and having a smaller thickness than that of the first portion; a second gate insulating layer on the first gate insulating layer; a semiconductor layer on the second gate insulating layer; a source electrode and a drain electrode spaced apart from each other on the semiconductor layer; a passivation layer on the second gate insulating layer, the source electrode and the drain electrode; and a pixel electrode on the passivation layer and connected with the drain electrode. The first gate insulating layer and the second gate insulating layer have stress in opposite directions from each other.
Public/Granted literature
- US20160218114A1 THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-07-28
Information query
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