Invention Grant
- Patent Title: High resolution projection micro stereolithography system and method
- Patent Title (中): 高分辨率投影微立体光刻系统及方法
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Application No.: US13149773Application Date: 2011-05-31
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Publication No.: US09492969B2Publication Date: 2016-11-15
- Inventor: Christopher M. Spadaccini , George Farquar , Todd Weisgraber , Steven Gemberling , Nicholas Fang , Jun Xu , Matthew Alonso , Howon Lee
- Applicant: Christopher M. Spadaccini , George Farquar , Todd Weisgraber , Steven Gemberling , Nicholas Fang , Jun Xu , Matthew Alonso , Howon Lee
- Applicant Address: US CA Livermore
- Assignee: Lawrence Livermore National Security, LLC
- Current Assignee: Lawrence Livermore National Security, LLC
- Current Assignee Address: US CA Livermore
- Agent James S. Tak
- Main IPC: G03H1/02
- IPC: G03H1/02 ; B29C67/00 ; G02B1/00 ; G02B5/00 ; G02B27/56 ; G03H1/00 ; G03H1/22 ; G03F7/20 ; B33Y30/00 ; B33Y10/00

Abstract:
A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.
Public/Granted literature
- US20150309473A1 High Resolution Projection Micro Stereolithography System And Method Public/Granted day:2015-10-29
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