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公开(公告)号：US09492969B2
公开(公告)日：2016-11-15
申请号：US13149773
申请日：2011-05-31
Applicant: Christopher M. Spadaccini , George Farquar , Todd Weisgraber , Steven Gemberling , Nicholas Fang , Jun Xu , Matthew Alonso , Howon Lee
Inventor： Christopher M. Spadaccini , George Farquar , Todd Weisgraber , Steven Gemberling , Nicholas Fang , Jun Xu , Matthew Alonso , Howon Lee
IPC: G03H1/02 , B29C67/00 , G02B1/00 , G02B5/00 , G02B27/56 , G03H1/00 , G03H1/22 , G03F7/20 , B33Y30/00 , B33Y10/00
CPC classification number: B29C67/0066 , B29C64/124 , B29C64/135 , B33Y10/00 , B33Y30/00 , G02B1/002 , G02B1/007 , G02B5/008 , G02B27/56 , G03F7/70408 , G03F7/70416 , G03H1/0005 , G03H1/0476 , G03H1/2294 , G03H2001/0094 , G03H2001/0482 , G03H2223/17 , G03H2225/60
Abstract: A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.
Abstract translation: 高分辨率PμSL系统和方法将一个或多个以下特征与标准PμSL系统结合使用SLM投影数字图像以在立体溶液浴中形成组件：用于产生亚衍射限制特征的多场超声 空间光调制器（SLM），以产生具有纳米尺度特征的空间控制的三维干涉全息图，以及将微流体成分整合到PμSL系统的树脂浴中，以制造不同材料的微结构。
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公开(公告)号：US20170057162A1
公开(公告)日：2017-03-02
申请号：US15352051
申请日：2016-11-15
Applicant: Christopher M. Spadaccini , Todd Weisgraber , George Farquar , Steven Gemberling , Nicholas Fang , Matthew Alonso , Jun Xu , Howon Lee
Inventor： Christopher M. Spadaccini , Todd Weisgraber , George Farquar , Steven Gemberling , Nicholas Fang , Matthew Alonso , Jun Xu , Howon Lee
CPC classification number: G02B1/007 , B29C64/124 , B29C64/135 , B33Y10/00 , B33Y30/00 , G02B1/002 , G02B5/008 , G02B27/56 , G03F7/70408 , G03F7/70416 , G03H1/0005 , G03H1/0476 , G03H1/2294 , G03H2001/0094 , G03H2001/0482 , G03H2223/17 , G03H2225/60
Abstract: A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.
Abstract translation: 高分辨率PμSL系统和方法将一个或多个以下特征与标准PμSL系统结合使用SLM投影数字图像以在立体溶液浴中形成组件：用于产生亚衍射限制特征的多场超声 空间光调制器（SLM），以产生具有纳米尺度特征的空间控制的三维干涉全息图，以及将微流体成分整合到PμSL系统的树脂浴中，以制造不同材料的微结构。
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公开(公告)号：US20150309473A1
公开(公告)日：2015-10-29
申请号：US13149773
申请日：2011-05-31
Applicant: Christopher M. Spadaccini , George Farquar , Todd Weisgraber , Steven Gemberling , Nicholas Fang , Jun Xu , Matthew Alonso , Howon Lee
Inventor： Christopher M. Spadaccini , George Farquar , Todd Weisgraber , Steven Gemberling , Nicholas Fang , Jun Xu , Matthew Alonso , Howon Lee
CPC classification number: B29C67/0066 , B29C64/124 , B29C64/135 , B33Y10/00 , B33Y30/00 , G02B1/002 , G02B1/007 , G02B5/008 , G02B27/56 , G03F7/70408 , G03F7/70416 , G03H1/0005 , G03H1/0476 , G03H1/2294 , G03H2001/0094 , G03H2001/0482 , G03H2223/17 , G03H2225/60
Abstract: A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.
Abstract translation: 高分辨率PμSL系统和方法将一个或多个以下特征与标准PμSL系统结合使用SLM投影数字图像以在立体溶液浴中形成组件：用于产生亚衍射限制特征的多场超声 空间光调制器（SLM），以产生具有纳米尺度特征的空间控制的三维干涉全息图，以及将微流体成分整合到PμSL系统的树脂浴中，以制造不同材料的微结构。
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