Invention Grant
- Patent Title: Ultraviolet curing apparatus having top liner and bottom liner made of low-coefficient of thermal expansion material
- Patent Title (中): 紫外线固化装置具有由低热膨胀材料制成的顶衬和底衬
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Application No.: US14079945Application Date: 2013-11-14
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Publication No.: US09496157B2Publication Date: 2016-11-15
- Inventor: Teng-Da Hung , Liang-Chang Hsieh , Chun-Lung Lin , Hsin-Hung Chi , Yun-Wen Chu , Jiun-Wei Su
- Applicant: Taiwan Semiconductor Manufacturing CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/67
Abstract:
An ultraviolet curing apparatus includes a chamber, a gas flow generator, and an ultraviolet lamp. The gas flow generator includes a top liner and a bottom liner coupled to each other. The top liner and the bottom liner are disposed in the chamber, and are made of low-coefficient of thermal expansion material. The ultraviolet lamp is disposed on the chamber and is configured for providing ultraviolet light.
Public/Granted literature
- US20150132973A1 Ultraviolet Curing Apparatus And Ultraviolet Curing Method Thereof Public/Granted day:2015-05-14
Information query
IPC分类:
