发明授权
- 专利标题： Liquid deposition composition and process for forming metal therefrom
- 专利标题（中）： 液体沉积组合物及其形成金属的方法
-
申请号： US14645366申请日： 2015-03-11
-
公开(公告)号： US09506149B2公开(公告)日： 2016-11-29
- 发明人: Owen J. Hildreth
- 申请人： NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
- 申请人地址： US DC Washington
- 专利权人： THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE
- 当前专利权人： THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE
- 当前专利权人地址： US DC Washington
- 代理商 Toby D. Hain
- 主分类号： B05D5/12
- IPC分类号： B05D5/12 ; C23C18/16 ; H01L21/3205 ; H01Q17/00 ; H01Q1/38 ; H01L21/306 ; H01L21/3063 ; H01L21/3065 ; B81C1/00
摘要：
A process for depositing a metal includes disposing a liquid deposition composition on a substrate, the liquid deposition composition including a metal cation; a reducing anion; anda solvent; evaporating the solvent; increasing a concentration of the reducing anion increases in the liquid deposition composition due to evaporating the solvent; performing an oxidation-reduction reaction between the metal cation and the reducing anion in response to increasing the concentration of the reducing anion when the reducing anion is present at a critical concentration; and forming a metal from the metal cation to deposit the metal on the substrate.
公开/授权文献
信息查询
