Invention Grant
US09512242B2 Polymerizable oligomer and photoresist composition comprising the same
有权
可聚合低聚物和包含其的光致抗蚀剂组合物
- Patent Title: Polymerizable oligomer and photoresist composition comprising the same
- Patent Title (中): 可聚合低聚物和包含其的光致抗蚀剂组合物
-
Application No.: US14348662Application Date: 2013-06-27
-
Publication No.: US09512242B2Publication Date: 2016-12-06
- Inventor: Wenwen Sun , Lin Li
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN201310072957 20130307
- International Application: PCT/CN2013/078199 WO 20130627
- International Announcement: WO2014/134889 WO 20140912
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F8/00 ; C08F220/10 ; C08F8/14 ; C08F8/24 ; G03F7/038 ; C08F220/00 ; G03F7/027 ; C08F220/20 ; G03F7/028 ; C08F220/02 ; C08F220/06 ; C08F220/18
Abstract:
The embodiments of the invention provide a polymerizable oligomer and a photoresist composition including the polymerizable oligomer, wherein the polymerizable oligomer contains a polymerizable double bond and a hydrophilic group.
Public/Granted literature
- US20160137758A1 POLYMERIZABLE OLIGOMER AND PHOTORESIST COMPOSITION COMPRISING THE SAME Public/Granted day:2016-05-19
Information query
IPC分类:
