Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US14657772Application Date: 2015-03-13
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Publication No.: US09529277B2Publication Date: 2016-12-27
- Inventor: Jan Steven Christiaan Westerlaken , Gerardus Arnoldus Hendricus Franciscus Janssen , Peter Paul Steijaert , Engelbertus Antonius Fransiscus Van Der Pasch , Franciscus Van De Mast
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20
Abstract:
A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
Public/Granted literature
- US20150185624A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-07-02
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