公开(公告)号：US10216102B2

公开(公告)日：2019-02-26

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03F7/20

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US09529277B2

公开(公告)日：2016-12-27

申请号：US14657772

申请日：2015-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US09891542B2

公开(公告)日：2018-02-13

申请号：US15387461

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US20170242349A1

公开(公告)日：2017-08-24

申请号：US15387461

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.