Invention Grant
US09530731B2 Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same
有权
用于修改线图案的光学邻近校正方法和由其修改的线图案的集成电路的方法
- Patent Title: Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same
- Patent Title (中): 用于修改线图案的光学邻近校正方法和由其修改的线图案的集成电路的方法
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Application No.: US14607051Application Date: 2015-01-27
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Publication No.: US09530731B2Publication Date: 2016-12-27
- Inventor: Kuan-Wen Fang , Chin-Lung Lin , Kuo-Chang Tien , Yi-Hsiu Lee , Chien-Hsiung Wang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G06F17/50 ; H01L23/528 ; G03F1/36 ; H01L23/522 ; H01L23/532
Abstract:
A method of optical proximity correction executed by a computer system for modifying line patterns includes the following steps. First, providing an integrated circuit layout with parallel line patterns and interconnect patterns disposed corresponding to the parallel line patterns. Then, using the computer to modify the integrated circuit layout based on a position of the interconnect patterns so as to generate a convex portion and a concave portion respectively on two sides of each of the parallel line patterns. Portions of the line pattern in front of and behind the convex portion and the concave portion are straight lines and have an identical critical dimension.
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