发明授权
- 专利标题： Polishing composition and method for nickel-phosphorous coated memory disks
- 专利标题（中）： 镍磷涂层记录盘的抛光组合物和方法
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申请号： US14515723申请日： 2014-10-16
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公开(公告)号： US09534147B2公开(公告)日： 2017-01-03
- 发明人: Hon Wu Lau , Selvaraj Palanisamy Chinnathambi , Ke Zhang
- 申请人： Cabot Microelectronics Corporation
- 申请人地址： US IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： US IL Aurora
- 代理商 Thomas Omholt
- 主分类号： C09G1/02
- IPC分类号： C09G1/02 ; B24B37/04 ; H01L21/306 ; G11B5/84
摘要：
The invention provides a polishing composition that contains (a) α-alumina particles that have an average particle size of about 250 nm to about 300 nm, (b) a per-type oxidizing agent, (c) a complexing agent, wherein the complexing agent is an amino acid or an organic acid, and (d) water. The invention also provides a method of polishing a substrate, especially a nickel-phosphorous substrate, with the polishing composition.
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